PECVD Working | Plasma Chemical Vapor Deposition system with preheating

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It can deposit SiOx, SiNx, amorphous silicon, microcrystalline silicon, Nano silicon, SiC, diamond-like carbon, and other films on the surface of the sheet or similar shape samples, and can deposit p-type and n-type doped films. To learn more, visit our website:

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PECVD Working | Plasma Chemical Vapor Deposition system with preheating | Vacuum Furnace